Nano Fabrication with Helium Ion Microscopy and X-ray Microscopy
Nano Fabrication with Helium Ion Microscopy and X-ray Microscopy
You aim at producing devices at the nano-scale and need precise size control, repeatability and speed.
Have you ever thought of using more than a Gallium beam? Why not combine three beams to achieve this result?
With ZEISS ORION NanoFab you profit from the only system in the world that covers the complete range of micromachining to nanomachining applications using gallium, neon and helium ion beams integrated in a single instrument. Use gallium ion beam for coarse milling, neon ion beam to machine for resolution milling and hellium ion beam for extremes resolution milling. Discover what is ideal to make precise, sub-10 nm structures that cannot be made using a gallium FIB alone. Imaging at extreme resolution with contrast known from Focused Ion Beam.
Alternatively, look inside your material finding sub-micron structures without destroying it. Discover the latest developments and learn more about lab diffraction crystallography with Xradia 520 DCT Versa from ZEISS.
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